Projektnummer

0052977

Zusammenfassung

This project investigates the deposition of multi-component materials by applying a novel type of magnetron sputtering, namely "serial co-sputtering". The basic principle is sketched as follows: The sputter source consists of a primary rotatable sputter target of material A and a secondary, fixed sputter target of material B. During operation of the primary sputter target, a thin metallic film of the material sputtered from target B is deposited onto its backside. In the primary sputtering process, this film gets implanted into the primary target material A, thereby enabling an increas...