Plasma printing of thin films with porous metal electrodes - P3M (Extension)
Projektnummer
0053650
Zusammenfassung
A new approach to micropatterned deposition of thin films on insulating or conductive substrates will be studied, based on highly porous metal sheets serving as gas-permeable backing plates for cavity-bearing layers, which can either be formed by an insulating sheet of a polymer such as PDMS, or a metal. Within the voids, formed by the substrates, microplasmas will be generated by excitation with AC voltages in the medium (MF) or radio frequency (RF) range and will be utilized for micropatterned plasma-deposition of thin films on substrate areas defined by the cavities. Source gases ar...
Projektinformationen
Status:
Beendet
Startdatum:
01.04.2009
Enddatum:
31.12.2011
Fördersumme:
590.700 €
Profilbereich:
Beendete Förderinitiativen
Förderinitiative:
Herstellung funktionaler Oberflächen
Ausschreibung:
Herstellung funktionaler Oberflächen