Projektnummer

0054961

Zusammenfassung

Serial co-sputtering involves several potential benefits compared to conventional magnetron sputtering, namely the enhancement of the deposition rate per power by co-doping with heavy elements, the possibility of a precise rate control by monitoring the material coverage of the rotating target, as well as the possibility of fabricating material compositions that are difficult to provide as conventional alloy target. Further, by modification of the primary target surface composition, process conditions such as target voltage and ion fluxes can be tailored. For these reasons, the project...